然而，这类芯片的制造高度依赖极紫外（EUV）光刻技术，该技术本身的规模化瓶颈已成为制约行业发展的关键障碍。 自2019年首批商用EUV芯片问世以来，设备迭代、掩模生成和光刻胶技术的持续改进已使该技术趋于稳定。尽管良率持续提升，但与成熟度更高的深 ...

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

ASML and imec, a research and innovation hub in nanoelectronics and digital technologies, have announced announced a strategic partnership agreement, focusing on research and sustainability.

Intel's new ASML EUV machines are in production, aiming to regain its edge after years of lagging behind Taiwan Semiconductor. Intel plans to use ASML's high NA machines for 18A chip technology ...