但芯片制造严重依赖极紫外光刻（EUV）技术，该技术却成为扩大生产规模的关键阻碍。自 2019 年首批商用 EUV 芯片下线以来，设备、光罩制作以及 ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

High NA EUV突破：英特尔季产3万片，imec 20nm良率90%，美光首用DRAM。 EUV技术自从其提出以来，面临着多重挑战，包括高成本、复杂的光学系统以及需要 ...

With single-patterning EUV, the goal is to print features with tight pitches. This requires a robust EUV resist with the right sensitivity and dose. “Dose is the amount of energy (per unit area) that ...