Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Intel将会使用High-NA EUV光刻机生产14A也就是1.4nm级工艺产品 ，但具体时间和产品未定，有可能在2026年左右量产，或许用于未来的Nova Lake、Razer Lake。

First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer, must be enclosed in a near-vacuum environment. Second, because EUV ...

快科技2月26日消息，ASML Twinscan EXE:5000 EUV是当今世界上最先进的EUV极紫外光刻机，支持High-NA也就是高孔径，Intel去年抢先拿下了第一台，目前已经在 ...

Discover why ASML dominates the lithography market with 90% DUV share, strong R&D, and robust growth prospects amid ...

快科技2月25日消息，Intel宣布，ASML首批两台高数值孔径（High-NA EUV）极紫光刻机已经在其工厂投入生产。初步数据显示，其效率、可靠性比上一代EUV ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...