The etching step is also self-limiting, as it stops once the modified layer is completely removed, exposing the underlying unmodified material. These two steps are repeated in a cyclic manner until ...

Atomic Layer Etching (or ALE) is a sophisticated etch method enabling outstanding depth control on shallow features. As device feature size decreases, ALE is required to achieve the accuracy needed ...

RIE is used in the fabrication of photonic devices, such as waveguides, gratings, and photonic crystals. The precise control over the etch depth and profile allows for the optimization of optical ...

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