Etching seems like such an old-fashioned technique (for a time it was also an Olympic competition) that you don’t normally ...

The datasheet for Queensgate’s NPS-XYP-250Q 300 mm wafer–mask alignment stage is now available. Goodman describes it as, “the ...

and followed by an alkaline solution etching step to the desired thickness, according to the team. The SiNx layer provides protection and enables the silicon in the edge region of the wafer to ...

etching, and 6) packaging. The process of creating semiconductors can be broken down into several key steps. The first step is wafer preparation. A silicon wafer is chosen as the starting material for ...

3) Si wet and dry etching: Si wet etching is the processing wafers by selectively dissolving them using chemicals (etchant). Si dry etching is the processing wafers using high-vacuum plasma.

Rather than etching a hypothetical graphene coating on a 300-mm silicon wafer to create a pattern of highly conducting graphene nanoribbons, would it be better to chemically functionalize selected ...

This system is limited to non-metal samples and currently is used for the etching of silicon oxide, silicon and descumming samples before metal deposition. It can process wafers up to 10 inches.

3. Plasma Etching: In this process, chemical etchant is introduced in the gas phase. For etching silicon oxide, CF4 (tetrafluoromethane) is used. In a chamber, there are two electrodes; one is holding ...

The chip industry is pushing to quadruple the stack height of 3D NAND flash from 200 layers to 800 layers or more over the next few years, using the additional capacity will help to feed the unending ...

Wafer processing equipment makes micro-electro-mechanical systems through bulk or surface micromachining. Bulk micromachining involves etching a structure into the silicon wafer substrate. Surface ...