Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Intel将会使用High-NA EUV光刻机生产14A也就是1.4nm级工艺产品 ，但具体时间和产品未定，有可能在2026年左右量产，或许用于未来的Nova Lake、Razer Lake。

快科技2月26日消息，ASML Twinscan EXE:5000 EUV是当今世界上最先进的EUV极紫外光刻机，支持High-NA也就是高孔径，Intel去年抢先拿下了第一台，目前已经在 ...

快科技2月25日消息，Intel宣布，ASML首批两台高数值孔径（High-NA EUV）极紫光刻机已经在其工厂投入生产。初步数据显示，其效率、可靠性比上一代EUV ...

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) lithography, has announced the appointment of Dinesh R. Bettadapur as its new ...

This is because all matter, including air, absorbs EUV radiation. For scanner manufacturers, this has two major consequences. First, it means that all the optical elements responsible for the ...