Ion implantation and annealing are critical processes ... These techniques are used to introduce impurities into the semiconductor lattice, which can modify its electrical properties and improve ...

Ion implantation has been widely used in the semiconductor industry for decades to ... can be continuously controlled by applying increasingly large doses of He ions into a crystal. The observed ...

However, the presence of defects and the effects of ion implantation can significantly influence its performance. Recent research has focused on understanding how helium behaves in SiC ...

Our ion implantation technique using the stencil mask is expected to significantly reduce ... This provides flexibility in material choice and device design because the mismatch in lattice constants, ...

Diamond, in its purest form, is a lattice of carbon atoms that has more than 500 documented defects that ... With accelerators, we can artificially create this defect with ion implantation and create ...

In this latter case, the isolation results from the induced lattice damage and hence it is dependent on a variety of parameters such as ion mass, dose, energy, and substrate temperature during ...