Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to ... there is still a long way to go from this proof-of-principle experiment to a commercial product. First, as we have seen with ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

In principle this enables the development of ... (Table 1), the problem is that they are not of a quality required for lithography and almost all of them suffer from a level of birefringence ...

“This is another huge step forward for MAPPER”, said MAPPER’s CEO, Dr. Christopher Hegarty. “We first demonstrated proof of principle of our massively parallel electron-beam maskless lithography ...

Working at i-line (λ=364nm), with standard novolak resists, we have demonstrated features as small as 50 nm. The processing has been developed and demonstrated with an interferometric lithography tool ...

cost-effective electron-beam lithography system designed for use in both industry and advanced research. Based on the Variable Shaped Beam (VSB) principle, these tools are utilized in a wide range of ...

A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

cost-effective electron-beam lithography system designed for use in both industry and advanced research. Based on the Variable Shaped Beam (VSB) principle, these tools are utilized in a wide range of ...