CCR Technology is a supplier of inductively coupled RF-Plasma Source for advanced thin film coatings and surface treatments. We serve the supply chain of system manufacturers and research groups in ...
Plasma power supplies are direct current (DC) and radio frequency (RF) devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) ...
Plasma generators produce the needed radio frequency (RF) power to create and maintain plasma in plasma chambers and similar devices. The plasma generated can be used in numerous applications ...