2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.

Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.

2024年4月18日 · Intel Foundry announced Thursday that it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in...

2022年5月26日 · For post-3nm nodes, ASML and its partners are working on a brand-new EUV tool — the Twinscan EXE:5000-series — featuring a 0.55 NA (High-NA) lens capable of an 8nm resolution, which is projected...

High-NA extreme ultraviolet (EUV) lithography is currently in development. Fabrication of exposure tools and optics with a numerical aperture (NA) equal to 0.55 has started at ASML and Carl Zeiss.

2023年12月11日 · New York state announced a partnership with IBM, Micron, and other industry players to invest $10 billion into expanding the Albany NanoTech Complex with a new cutting-edge High NA EUV Center that will drive the next decade of …

Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing.

2022年5月12日 · At the recent SPIE Advanced Lithography Conference, imec presented several papers on various aspects of high-NA EUV. Imec and ASML have created a high-NA lab, which will receive the first scanner from ASML.

2023年7月29日 · Called high-numerical-aperture EUV lithography, it involves a major overhaul of the system’s internal optics. High-NA EUV should be ready for commercial use in 2025, and chipmakers are depending on its capabilities to keep their …