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A 0.5-NA extreme ultraviolet micro-field exposure tool has been installed and commissioned at beamline 12.0.1.4 of the Advanced Light Source synchrotron facility at Lawrence Berkeley National Laboratory. Commissioning has demonstrated a patterning resolution of 13 nm half-pitch with annular 0.35 – 0.55 illumination; a patterning resolution of.

2018年10月12日 · The Berkeley MET5, funded by EUREKA, is the world’s highest-resolution EUV projection lithography tool. With a 0.5-numerical aperture (NA) Schwartzchild objective, the Berkeley MET5 is capable of delivering 8-nm resolution for dense line/space patterns.

2025年2月12日 · MET5/YJR137C encodes an H2S-NADP oxidoreductase involved in sulfate assimilation and sulfur amino acid biosynthesis. It localizes to the cytoplasm, vacuole, and cell periphery and is a subunit of the sulphite reductase complex.

These are high-level summaries/ overviews of each field. Detailed PDFs of each field can be downloaded just below the link you clicked to open this document. 1. Line end: horizontal 2. Line end: vertical 3.

Berkeley MET5 Platform Patrick Naulleau, Arnaud Allezy, Chris Anderson, Carl Cork, Paul Denham, Mike Dickinson, Geoff Gaines, Ken Goldberg, Ryan Miyakawa, Seno Rekawa, Will Thur, Dan Zehm, Berkeley Lab Regina Soufli, Lawrence Livermore Lab Russ Hudyma, Hyperion Mark Bremer, Luc Girard, Bob Kestner, John Kincade, Zygo