Our Ultra FnA ALD system delivers everything you look for in high-throughput batch ALD processing. It deposits both silicon nitride (SiN) and silicon carbide nitride (SiCN) with good …

2024年12月10日 · ACM’s Ultra Fn A Thermal ALD Tool has been qualified for the deposition of silicon carbon nitride (SiCN) films. It enables ultra-thin, void-free film deposition with precise …

Part of ACM’s Ultra family of advanced wafer processing systems, the Ultra Furnace platform addresses dry processing challenges of low-pressure chemical vapor deposition (LPCVD), …

2024年12月10日 · ACM also announced that its Ultra Fn A Thermal Atomic Layer Deposition (Thermal ALD) Furnace tool, introduced in 2022, has successfully completed process …

2024年12月11日 · ACM’s Ultra Fn A Thermal ALD Tool has been qualified for the deposition of silicon carbon nitride (SiCN) films. It enables ultra-thin, void-free film deposition with precise …

In this thesis, a new method for ALD nanoparticle synthesis was developed that can be used to prepare catalysts. Using oxygen gas as the co-reactant, area-selective ALD of metal oxides by …

2022年9月27日 · The Ultra Fn A system adds thermal atomic layer deposition (ALD) to ACM’s extensive list of supported furnace applications. The company also announced that it has …

Explore advanced semiconductor process systems across Wet Processing, ECP, Thermal Deposition Processes, Track Systems, PECVD and Polishing.

2024年12月12日 · ACM’s Ultra Fn A Thermal ALD Tool has been qualified for the deposition of silicon carbon nitride (SiCN) films. It enables ultra-thin, void-free film deposition with precise …

2024年8月11日 · The Ultra FnA Furnace System by ACM Research is designed for the precise and uniform deposition of ultra-thin films using thermal Atomic Layer Deposition (ALD), which …