2022年1月25日 · AGC（AGC株式会社、本社：東京、社長：平井良典）は、グループ会社であるAGCエレクトロニクス（本社：福島県郡山市、社長：佐藤弘昌）において、EUV露光用フォトマスクブランクス（以下、EUVマスクブランクス）の生産能力を増強することを決定しました。 2023年1月より生産を開始し、段階的に増強を行うことにより、AGCグループのEUVマスクブランクス生産能力は2024年に現在の約2倍になります。 近年、半導体生産においてEUVプロセ …

2022年1月25日 · Production will begin in January 2023, and through gradual expansion, the AGC Group's EUVL mask blank production capability will approximately double from its current level in 2024. In recent years, the EUV process has been increasingly adopted in semiconductor production, not only for logic devices but also for DRAM *1 and other memory devices.

2023年4月27日 · Demand for EUVL mask blanks is expected to grow significantly in the future as the production of high-performance semiconductors expands. AGC has decided to boost its production capacity to address this increased demand and to produce next-generation products required for further miniaturization of semiconductor manufacturing processes.

EUVL mask blanks are a low-thermal expansion glass substrate with various optical coating films on its surface. An EUV photomask comprises a semiconductor chip circuitry pattern formed onto the surface of an EUVL mask blank, which is then transferred onto a silicon wafer to create a semiconductor chip.

4月27日，AGC已决定提高其全资子公司AGC Electronics的EUV曝光用光掩模坯料（EUV掩模坯料）的产能。 通过2024年1月开始运营并分阶段增加产能，到2025年AGC集团的EUV掩模坯产能将比目前水平增加约30%。

2023年4月27日 · AGC is the world’s only manufacturer of EUVL mask blanks that can handle every aspect from “glass materials” to “coating”. AGC’s EUVL mask blanks have been adopted by several logic and memory semiconductor manufacturers, thanks to the overall reputation of AGC’s high technology and quality, from glass material technology to film ...

Optical properties of AGC’s mask blank are getting closer to the specification for mass production. New Ta-based material has good properties for absorber. It’s to be patterned and evaluated. big challenge. The methodology in each process is now being built up in AGC.

2022年2月7日 · AGC作为全球唯一一家可以横跨“玻璃材料”到“涂布”的EUV光掩膜坯厂家，一直在根据市场需求、有计划地实施必要投资。 在2020年7月，AGC电子决定进行厂房扩建的大规模增强工事，并已经于. CINNO Research 产业资讯，AGC株式会社（旧名旭硝子，以下简称为“AGC”）旗下子公司AGC电子株式会社，决定扩大用于EUV曝光的光掩膜坯（Photo Mask Blanks，以下简称为“EUV光掩膜坯”）产能。 且宣布该计划自2023…

AGC can provide 1st generation EUVL blanks suitable for EUVL pilot lines with PPT exposure tools. The ML blank defect and its inspection are remaining technical issues for HVM. AGC has been optimizing the EUVL blank fabrication processes to reduce the defect. The current best defect performance is 0.12/cm2 at 50nm SiO2 w/M7360.

AGC Electronics America: High-purity SiC, CMP, EUV Blanks, and more for semiconductor manufacturing. Enhance your production with our advanced materials.