Area-selective atomic layer deposition on 2D monolayer lateral ...
2024年3月8日 · Recently, area-selective atomic layer deposition (AS-ALD), which allows the direct deposition of target materials on the desired area using a deposition barrier,...
Tailoring amorphous boron nitride for high-performance two
2024年5月13日 · ALD deposition temperatures between 125 and 250 °C result in stoichiometric films with high oxidative stability, yielding a dielectric strength of 8.2 MV/cm. Utilizing a seed …
Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films …
2023年9月1日 · In this paper, the atomic layer deposition (ALD) of ultra-thin films (<4 nm) of Al 2 O 3 and HfO 2 on gold-supported monolayer (1L) MoS 2 is investigated, providing an insight …
In situ measurements of the atomic layer deposition of high-k ...
Abstract: We investigated in situ the atomic layer deposition (ALD) of high-k dielectrics for advanced microsystems by ultra high vacuum (UHV) atomic force microscope (AFM). With our …
Structural characterization of AlN thin films grown on sapphire by ...
2023年5月31日 · Various material characterization techniques were applied to investigate the morphological, structural, and optical properties of the AlN films, including atomic force …
Low-temperature atomic layer epitaxy of AlN ultrathin films by …
2017年1月3日 · Atomic layer deposition (ALD) is an emerging and attractive technique for preparing nanoscale ultrathin films because of high uniformity over a large area, accurate...
Interfaces in Atomic Layer Deposited Films: Opportunities and ...
2023年9月24日 · ALD is a versatile technique for the deposition of thin films with atomic-level precision and uniformity. The use of seed layers in ALD can significantly influence the …
一线大佬详解！关于AFM，读这篇文章就够了 - 知乎
2023年11月2日 · 相图是AFM轻敲模式下的一种重要扩展技术，因表面抵挡及黏滞力的作用，会引起振动探针的相位改变量，而抵挡及黏滞力的差异由不同材料性质引起，因此相位差可以用于 …
Characterization of Al2O3 Thin Films Prepared by Thermal ALD
2015年8月1日 · Film thickness and refractive index were measured by spectroscopic ellipsometry. Atomic Force Microscopy (AFM) was used to confirm the thickness evaluation and to control …
ALD 用户分享|昆明理工大学马文会教授团队《AFM》：光伏硅切 …
2024年6月7日 · Forge Nano Promotheus 流化床原子层沉积系统采用流化床技术实现粉料分散，专为粉末 ALD 设计，可开发探索复杂的高比表面积粉末涂层，同时可实现克级到公斤级粉末材 …