Nanoporous Anodic Aluminum Oxide films on Al foil are now available with conformal coatings of different materials on the pore walls by Atomic Layer Deposition. ALD offers unmatched control of both the thickness and the composition of the coatings, as well as uniform coverage inside high aspect ratio nanopores.

The synergistic combination of ALD with Anodic Aluminum Oxide (AAO) enables control of both the nanoscale geometry and chemistry with precision unavailable with other processes and materials. The resulting well-characterized nanomaterial platform is ideally suited to support development and validation of high surface area ALD as well as to ...

The combination of zinc oxide (ZnO) thin film and anodized aluminum oxide (AAO) with the assistance of atomic layer deposition (ALD) technique is performed to investigate into the luminescence tailoring effect and mechanism of such a light emitting device, considering the strong luminescence of both ZnO and AAO nanostructures.

2009年11月1日 · The presented results show that the structural (pore size) properties of AAO membranes can be altered systematically by adjusting the number of ALD cycles. The pore sizes of the AAO membranes were reduced to allow for molecular separations.

2024年9月5日 · Herein, we have fabricated AAO@Ti and ALD-alumina coated AAO@Ti substrates (ALD@AAO@Ti) to address the contribution of ionic and topographic factors on osteoblastic cell behavior on anodized surfaces for the ultimate goal of utilizing such coatings on Ti implants to accelerate osteointegration in large-area deformations.

Atomic layer deposition (ALD) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide (AAO) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d 40nm and pore length L 70 microns.

In our ALD process optimization for large area MCPs, we adopted anodic aluminum oxide (AAO) as a process optimization tool instead of large MCPs as a cost effective measure. High aspect ratio AAO sheets with surface area similar to that of prototype devices were used to

2015年4月8日 · The ALD process enabled the rapid, simple synthesis of highly ordered TiO2 nanowire arrays with desired parameters such as diameter, density, and thickness determined using diverse AAO templates. Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization ...

2016年9月1日 · Al 2 O 3 films was deposited by ALD method in temperature 150, 225 and 300 °C. Combined SEM, AES and ToF-SIMS studies confirmed chemical composition of the layers. The best properties exhibits the layer deposited at 300 °C.

通过原子层沉积 (ALD) 在阳极氧化铝 (AAO) 模板的孔内制备高度有序的氧化锆和氧化铪纳米管。 扫描电子显微镜 (SEM) 和能量色散光谱 (EDS) 用于表征不同的形态和元素组成以及整个样品横截面的 EDS 映射。 AAO 通道的直径范围为 200 nm，厚度为 60 μm。 氧化铪和氧化锆纳米管的长度和直径取决于孔径、应用的 AAO 模板的厚度和 ALD 沉积时间。 结果表明，在 AAO 模板的孔中，管非常均匀地组装并相互平行。 通过原子层沉积 (ALD) 在阳极氧化铝 (AAO) 模板的孔内制 …