ALD (Atomic Layer Deposition) - 知乎
ALD是通过将 气相 前驱体脉冲交替地通入 反应器 并在基体上 化学吸附 并反应而形成薄膜。 通过供给惰性气体（Ar,N2等）分隔各种反应物，单个原子层沉积，并重复沉积控制厚度。
Batch ALD: Characteristics, comparison with single wafer ALD, …
2007年9月25日 · A comparison is made between single-wafer and (vertical) batch systems for Atomic Layer Deposition (ALD). Various characteristic times that play a role in such systems …
Atomic layer deposition (ALD) is a thin-film growth technology that is capable of depositing conformal, pinhole-free, and uniform films on high-aspect-ratio surfaces with atomic precision. …
ALD: Atomic Layer Deposition, Precise and Conformal Coating
2014年1月1日 · ALD (atomic layer deposition), originally known as ALE (atomic layer epitaxy), is a special kind of chemical vapor deposition process. It was firstly developed by T. Suntola in …
Merits of Batch ALD - IOPscience
2014年8月13日 · An overview of the merits and applications of batch ALD in a vertical furnace will be presented. We address new material and process developments and throughput …
Applied Picosun Sprinter
The Applied ™ Picosun ™ Sprinter ™ system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the IoT, Communications, Automotive, Power, and Sensors …
批次热ALD_厦门韫茂科技有限公司-全栈式薄膜沉积设备,超高真空设备,粉末ALD,生产ALD
多片批次式ALD，能够实现全自动、多片、连续化生产，有效提高产能，降低COO。 并且多片批次式ALD能够实现原子级别的精确控制，ALD沉积薄膜无针孔，质量高，可作为高K值介质 …
The Study of Silicon Nitride Films Deposited In Batch ALD System
To compensate this, batch ALD system such as vertical furnace has been designed for ALD process with a batch up to more than 100 wafers. However, the complex dynamic and …
ALD | Applied Materials
Applied Morpher Batch ALD product platform is designed to disrupt the up to 200 mm wafer industries in Beyond and More than Moore technologies. Applied Picosun Morpher P system …
We present ALD SbOx as a new material on the batch platform. For the workhorse ALD Al2O3 and TiN materials, experimental and simulation results demonstrate that a reduction in cycle …