2015年2月6日 · Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise design and synthesis of catalytic materials. Herein, we discuss examples in …

原子层沉积 (Atomic Layer Deposition, ALD)是一种基于化学气相沉积 (CVD) 的高精度薄膜沉积技术，是将物质材料以单原子膜的形式基于化学气相一层一层的沉积在衬底表面的技术。

2024年5月7日 · 原子层沉积技术（ALD）是一种一层一层原子级生长的薄膜制备技术。 理想的 ALD 生长过程，通过选择性交替，把不同的前驱体暴露于基片的表面，在表面化学吸附并反应 …

2022年11月24日 · In this review, we focus on the recent breakthroughs of ALD for the design of advanced materials and structures in electrochemical energy devices. The function and merits …

2019年2月12日 · Development of atomic layer deposition (ALD) processes, either to enable fabrication of new materials by ALD, as well as to improve existing ALD materials, is an …

2024年5月22日 · Atomic layer deposition (ALD) is a vapor-phase thin film deposition technique that offers exceptional uniformity and precise control over thickness.

2024年12月17日 · Atomic layer deposition, or ALD, is a manufacturing approach that deposits materials and films in exact places. This can include metals on top of metals, dielectrics on …

This tutorial will describe several critical, and often under-discussed, aspects of ALD reactor hardware design and process control. The discussion will begin with a primer on vacuum …

2024年5月22日 · With the aid of various modern computational chemistry tools, tailor-made molecular design of the ALD precursors for high deposition selectivity may become possible. …

How to design properties needed for ALD precursors: Reactivity, Stability, Volatility, Melting Point Harvard University Outline Examples: amidinates of Ni, La, Lu, Ti(III), Zr, Hf, Co