Oxford Instruments’ ALD product family offers a unique range of flexibility and capability in the engineering of nanoscale structures and devices by combining remote plasma ALD processes …

The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes …

Atomic Layer Deposition (or ALD) is an advanced deposition technique that allows for ultra-thin films of a few nanometres to be deposited in a precisely controlled way. Not only does ALD …

原子层沉积（Atomic Layer Deposition，ALD）是一种先进的沉积技术，允许以精确控制的方式沉积数纳米厚度的薄膜。 ALD不仅提供了出色的厚度控制和均匀性，还能够对高长宽比结构进 …

Oxford Instruments ALD The Business of Science® Cutting edge plasma ALD systems with thermal ALD as standard Mixed mode operation within a single recipe No hardware changes …

2023年8月22日 · The Atomic Layer Deposition (ALD) system is an Oxford Instruments Plasma Technology FlexAL II platform that is designed to grow thin films one atomic layer at a time …

2023年7月14日 · Oxford Instruments today announces the launch of the PlasmaPro ASP, a high-rate atomic layer deposition (ALD) research system within its Atomfab® product range. The …

Atomic Layer Deposition (ALD) offers precisely controlled ultra-thin films for advanced applications on the nanometre scale, with conformal coating into high aspect ratio structures.

Atomic Layer Deposition (ALD) offers the opportunity to create precisely controlled structures for advanced semiconductor and other nanotechnology applications, by creating ultra-thin films on …

2024年4月30日 · The Oxford OpAL is a plasma or thermal assisted atomic layer deposition (ALD) tool used to deposit Al 2 O 3. It is an open loop (non-loadlocked) tool which had two channels …