Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of …

2024年5月7日 · 原子层沉积技术（ald）是一种一层一层原子级生长的薄膜制备技术。理想的 ald 生长过程，通过选择性交替，把不同的前驱体暴露于基片的表面，在表面化学吸附并反应形成沉 …

2015年2月6日 · ALD is a technique for synthesizing catalysts at the atomic level that has gained attention for its application to heterogeneous catalysts in the past few years. ALD provides the …

原子层沉积 (Atomic Layer Deposition, ALD)是一种基于化学气相沉积 (CVD) 的高精度薄膜沉积技术，是将物质材料以单原子膜的形式基于化学气相一层一层的沉积在衬底表面的技术。

2019年7月18日 · During this workshop it became clear that the main application the semiconductor industry is currently looking at for area-selective atomic layer deposition (ALD), …

2022年4月8日 · Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting surface reactions, ALD has excellent …

What is Atomic Layer Deposition (ALD)? ALD is a sequential, self limiting surface reaction, based on two or more reactants •Precise thickness control •Growth rate is independent of precursor …

2017年1月3日 · Atomic layer deposition (ALD) is an emerging and attractive technique for preparing nanoscale ultrathin films because of high uniformity over a large...

2015年1月1日 · Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-phase deposition technique for preparing ultra-thin films with precise growth control. …

2012年2月2日 · Atomic layer deposition (ALD) is a variant of chemical vapor deposition (CVD) techniques capable of angstrom-resolution, layer-by-layer growth of compound films. 1–4 ALD …