Computational scanner wafer mark alignment - SPIE Digital …
ASML’s Design for Control (D4C) application for wafer alignment mark design has been extended to support the computational prediction of alignment mark performance for the latest alignment …
A Snapshot of Our Electrical Engineering Team at ASML - LinkedIn
2022年1月24日 · The first is the D4C (Design for Control) software, which optimizes the mark design for the ASML YieldStar tool. This is a mature software product used by all advanced …
Improving scanner wafer alignment performance by target …
ASML's Design for Control (D4C) application, which is currently used to optimize YieldStar diffraction based overlay (DBO) metrology targets, has been extended to support the …
Robust alignment mark design for DRAM using a holistic …
2019年3月20日 · In this paper, we present a holistic computational approach to design robust alignment marks with ASML’s integrated Design for Control (D4C) and OPC solutions. With …
Computational scanner wafer mark alignment - NASA/ADS
ASML's Design for Control (D4C) application for wafer alignment mark design has been extended to support the computational prediction of alignment mark performance for the latest alignment …
Robust alignment mark design for DRAM using a holistic …
In this paper, we present a holistic computational approach to design robust alignment marks with ASML's integrated Design for Control (D4C) and OPC solutions. With this integrated solution, …
Facing such issue, ASML software department decided to start with the develop-ment of the IVSA redesign using the new reference architecture (DCA) and em-ploying model-driven …
Improving scanner wafer alignment performance by target optimization ...
2016年3月24日 · ASML’s Design for Control (D4C) application, which is currently used to optimize YieldStar diffraction based overlay (DBO) metrology targets, has been extended to support the …
Improving scanner wafer alignment performance by target …
2016年3月24日 · ASML’s Design for Control (D4C) application, which is currently used to optimize YieldStar diffraction based overlay (DBO) metrology targets, has been extended to support the …
Comparison of the Design for Control (D4C) simulation result (left ...
Comparison of the Design for Control (D4C) simulation result (left scale) with the measurement result of the higher-order residual through wavelength. The minimum simulated APD as well …
- 某些结果已被删除