ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip. Our immersion systems lead the industry in productivity, imaging and overlay performance for high-volume manufacturing of the most advanced Logic and Memory chips.

In this system, novel gas lifetime extensions reduce machine downtime and reinforce proven 6 kHz ArF laser technology to provide high power to support high throughput. Immersion hood design improvements widen the window to optimize …

Solutions in place for cross-platform matching DUV to EUV. Various alignment- & focus-control and dose (laser power) packages available.

The TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. Built on the future-proof NXT4 platform, our TWINSCAN NXT:2050i pushes overlay limits and offers unparalleled productivity for an immersion lithography system.

Update 11/06/2023 8:15am PT: An ASML representative tells us that the statement that ASML would install 600 DUV machines in China is the result of a mistranslation. Instead, ASML's target...

4 天之前 · asml ceo彼得·温宁克曾坦言：“如果中国掌握duv技术，全球半导体格局将彻底改写。 ” 当前，中国已占据全球70%的成熟制程芯片产能，而3nm技术的突破将进一步挤压ASML在高端市场的份额。

2018年8月3日 · 据外媒报道，光刻机霸主ASML（阿斯麦）已经开始出货新品Twinscan NXT:2000i DUV（NXT:2000i双工件台深紫外光刻机），可用于7nm和5nm节点。NXT:2000i将是NXE:3400B EUV光刻机的有效补充，毕竟台积电/GF的第一代7nm都是基于DUV工艺。

2024年7月29日 · DUV（Deep Ultraviolet），深紫外光刻，是介于Vacuum UV（157nm，F2）与UV（365nm，i line）之间的光线，一般是指KrF(248nm),ArF(193nm)两种波长。 而浸没式光刻机则以ArF为主，浸没式光刻机 晶圆 与透镜之间引入高折射率的液体（如水），大大提高了光刻分辨 …

4 天之前 · ASML的DUV光刻机依赖氟化氙准分子激光，通过复杂的气体混合生成193nm波长的紫外光。然而，这项技术被2万多项专利封锁，且能耗高、维护复杂，成为“卡脖子”的关键。中科院的固态DUV光源另辟蹊径：利用Yb:YAG晶体生成1030nm红外激光，通过谐波转换和光学参数 ...

2023年9月1日 · 那么根据最新变化，明年1月起，asml三款先进浸没式深紫外光刻机 (duv) 设备将不会对中国出口，这对国内半导体产业链将造成深远的影响。 美国出口 ...