An ABI HVM (Actinic Blank Inspection for High Volume Manufacturing) tool will be developed, by taking over the concept of principle verification for the dark field ABI tool accomplished by MIRAI Project(I,II,III).

2. ABI tool development - EIDEC develops ABI tool for hp16nm HVM with Lasertec Corp. succeeding to the achievement of Selete - Detection capability for1nmH/50nmW defect has been demonstrated ⇒ Analysing signal to improve detection and tool stability - High magnification review optics for defect mitigation

ABI HVM tool has a capability of detecting 16nm node size defects. ABI platform is extendable for the future nodes inspection by reducing the pixel size. In many cases, ABI signal intensity does not match the AFM measured defect size on multilayer. Printability study is required. ABI HVM with high magnification review provides

2019年11月25日 · After 18 years of technology development, ABI tools are now used for EUV mask blank qualification by all EUV blank suppliers. For inspecting EUV mask blanks, the ABI tool has three characteristics. The first characteristic is phase defect detection capability. EUV mask blanks use Mo/Si multilayer stacks as their EUV reflective layer.

Lasertec 销售用于 EUV 掩模坯料的光化坯料检测 (ABI) 系统。 ABI 工具使用 13.5 纳米波长，具有 1 纳米（高度）x 40 纳米（宽度）的灵敏度，缺陷定位精度为 20 纳米。

• For mask inspections ABI AIMS APMI : 30 >100 W/mm2·sr within etendue of 4∙10-3 25∙10-4 1.5∙10-2 mm ·sr LPP & DPP can produce Sn, Xe… plasma radiating at EUV range ... on CCD, 1 kHz EUV pulses, image sensor to source 104 cm, untreated raw data Pseudo colour size is less than 180um . COPIRIGHT, 2011 NANO-UV 2011 International Workshop

2013年4月1日 · A high volume manufacturing (HVM) model of EUV Actinic Blank Inspection (ABI) tool has been developed for the purpose of detecting phase defects on EUV masks.

2017年4月3日 · Lasertec Corporation has released ABICS E120, a EUV mask blank inspection and review system that contributes to defect management and yield improvement in the production of EUV mask blanks. The new system will be introduced at Photomask Japan 2017, which begins on April 5, 2017.

2009年3月1日 · We have developed an actinic full-field EUV mask blank inspection tool that consists of an EUV light source, a 26X Schwarzschild optics for dark-field imaging, an EUV-sensitive...

2012年6月1日 · In this paper we describe a high accuracy defect locating function of the EUV Actinic Blank Inspection (ABI) tool being developed for HVM hp16 nm and 11 nm nodes.