Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications. Adlyte provides the semiconductor industry with high brightness extreme ultraviolet (EUV) sources. Our laser produced plasma technology enables manufacturing of …

Adlyte provides high brightness EUV (Extreme Ultra Violet) light sources for metrology and lithography applications. Companies developing EUV tools can depend on the reliability and operational performance of the Adlyte EUV sources. Our products enable high throughput and low down time in high volume manufacturing.

Adlyte is a pioneering company that designs and manufactures EUV light sources. Our innovative technology delivers a high brightness solution for the semiconductor industry. We generate clean cost-effective photons.

Adlyte has been developing a droplet based laser produced plasma (LPP) light over the last decade, specifically focused on the needs of actinic mask inspection for AIMS, Blank and Pattern Tools. Here, latest technical improvements in the EUV brightness and stability of the LPP light source will be presented.

Droplet dispenser with >30 μm tin droplet generation for hours of operation. Droplet tracking system with laser triggering on individual droplets enables droplet-laser alignment within <10% of droplet diameter. Debris mitigated grazing incidence collector, including clean IF module with imaging capability.

Adlyte AG, a Swiss Company, has been developing unique Laser Produced Plasma light source technology over last 10+ years for use in semiconductor production Very high brightness droplet-based light source for next generation wafer and mask inspection tools, covering from around 0.1 nm to 200 nm wavelength

EUV radiation measurements and results. Adlyte Ltd. Products: Debris mitigation results from HPS. 64 members of staff including PhD students, post-docs, Msc students, Electrical engineers and Workshop technicians. AO16 Nd:YAG Laser, 1064 nm, 20 kHz, 1.6 kW. Entire system automated from a single control unit.

Adlyte provides high brightness EUV (Extreme Ultra Violet) light sources for metrology and lithography applications. Companies developing EUV tools can depend on the reliability and operational performance of the Adlyte EUV sources. Our products enable high throughput and low down time in high volume manufacturing.

2012年11月16日 · One of three laser-produced plasma (LPP) EUV light source suppliers in the world, Adlyte is the only one focused on developing light sources for photomask and wafer inspection applications, which are critical for manufacturing future generations of advanced semiconductor devices.

Adlyte’s light source for APMI –Key nominal numbers § Nd:YAGlaser: average power of 1.6 kW, λ= 1.064 μm,10-20 kHz rep. rate, typically Irradiance= 80 -200 GW/cm2 § In-house droplet dispenser with >30 µm tin droplet generation § Closed loop droplet tracking system with laser triggering on individual droplets enables droplet-laser