Mask Qualification Solutions by ZEISS SMT - ZEISS Vision Care
ZEISS AIMS 1x-193i is used for defect review, printability analysis and repair verification and qualifies photomasks with high precision and accuracy for today technology nodes. Addresses …
30 years of AIMS® - the industry standard for mask qualification
2023年12月12日 · AIMS® systems have consistently demonstrated their value in the semiconductor industry for 30 years. Mask manufacturers rely on AIMS® for inspecting …
(PDF) Advances with the new AIMS (TM) fab 193 2nd
2005年6月28日 · The AIMS™ fab 193 allows a rapid prediction of wafer printability of critical mask features, including dense patterns and contacts, defects or repairs by acquiring through-focus …
Advances with the new AIMS fab 193 2nd generation: a system …
2005年6月28日 · A new AIMS fab 193 second generation system with a maximum NA of 0.93 is now available. Improvements in field uniformity, stability over time, measurement automation …
ZEISS launches next generation AIMS™ system - Business Wire
2014年6月23日 · ZEISS introduces the new mask qualification system AIMS™ 1x-193i at EMLC Conference. With a completely redesigned optical system it enables high level illumination …
ZEISS launches next generation AIMS™ system - Cambridge …
2014年6月23日 · AIMS™ enables the user to qualify the optical performance of a mask under scanner equivalent illumination conditions. The AIMS™ 1x-193i works with 193nm illumination …
二手 ZEISS / CARL ZEISS AIMS 1x-193i 设备 - Moov
Ensures perfect printing performance for high-end masks ZEISS AIMS 1x-193i is used for defect review, printability analysis and repair verification and qualifies photomasks with high precision …
AIMS® (Aerial Image Measurement System) is a unique mask qualification system for defect review, printability analysis, and repair verification of todays and future generation …
Aerial image measurement technique for today's and future …
The AIMS™ fab 193 allows a rapid prediction of wafer printability of critical mask features, including dense patterns and contacts, defects or repairs by acquiring through-focus image …
<title>Advances with the new AIMS fab 193 2nd generation: a …
By adjustment of numerical aperture (NA), illumination type and partial coherence (σ) to match any given stepper/ scanner, AIMS™ predicts the printability of 193nm reticles such as binary …