2018年11月1日 · In this work aluminium (Al) films were deposited on different substrates, and their phase, microstructure and film growth process were tracked. Three types of substrates were explored to determine the influence of the substrate on the film growth process.

2018年5月30日 · Aluminium thin films exhibit excellent coating properties suitable for optical, microelectronics, telecommunications and constructional/structural applications. Thin aluminium film deposition is mainly accomplished via physical or chemical methods at varying deposition conditions, parameters and substrates.

2023年3月1日 · Here, we report a threefold enhancement of the superconducting critical temperature and gap size in ultrathin epitaxial Al films on Si (111), when approaching the 2D limit, based on high-resolution scanning tunneling microscopy/spectroscopy (STM/STS) …

2011年9月1日 · In the present study 10 Al/a-Si/glass specimens were prepared in order to evaluate the effects of Al film thickness and annealing temperature on the Si crystallization efficiency, mean μc-Si grain size, and the quantities of defects (voids/crevices and hillocks) formed in the composite film.

2016年2月2日 · In this work, we propose a two-step approach to prepare Al nanomesh thin films through direct AAO wet-etching treatment. The porous alumina films derived from anodizing can served as a template...

In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and examined their phase, microstructure, and film growth process. We estimated that films of up to 30 nm thickness were mainly amorphous in nature. When the film thickness exceeded 30 nm, crystallization was observed.

2014年6月27日 · Atomic layer deposition (ALD) is a gas–solid reaction technique for thin film preparation. It is similar to chemical vapor deposition (CVD), except that the precursor materials enter into the reaction chamber separately and breaks the CVD reaction into two half-reactions at the surface of the deposition substrate.

2020年10月27日 · Epitaxial aluminum films with superb crystallinity, high surface smoothness, and interface sharpness were successfully grown on the c-plane of sapphire using sputter beam epitaxy. This study...

2020年5月9日 · The density and pore diameter of aluminum (Al) films have an important influence on the resultant film applications, especially in the field which require extremely high-density, uniform Al films. In this study, Al was electrodeposited from 1-ethyl-3-methyl imidazolium chloride ([EMIm]Cl) ionic liquid onto a Ni substrate using AlCl3 as the Al ...

We propose a method to improve Al thin film in the chemical vapor deposition (CVD) using superior Al precursor, Aluminum borohydride trimethylamine (AlBT). The deposition conditions of AlBT, which can improve factors such as sheet resistance (Rs) and reflective index (R.I.) that are related with the morphology of the CVD-Al film are optimized.