
Defect Inspection & Review | Chip Manufacturing - KLA
KLA’s defect inspection and review systems cover the full range of yield applications within the chip manufacturing environment, including incoming process tool qualification, wafer qualification, research and development, and tool, process and line monitoring.
KLA-Tencor 推出 2830、Puma 9500 系列和 eDR-5210 专门针对 3Xnm 和 2Xnm 节点的晶圆缺陷检测和再检测系列 • 新型 2830 系列宽波段明场晶圆缺陷检测系统采用 PowerBroadband TM 技术;有了这
brightfield inspector ensures maximum sensitivity over a broad range of immersion litho materials and defect types. Immersion lithography is a key enabling technology for 65nm and 45nm device patterning.
Defect Inspection - KLA
KLA has a comprehensive portfolio of defect inspection and review systems for advanced chip manufacturing, including additional Surfscan ® unpatterned wafer inspection systems and broadband plasma optical patterned wafer inspectors.
KLA-Tencor Boosts 45nm Defect Capture, Doubles ... - KLA …
2007年6月26日 · KLA-Tencor (NASDAQ: KLAC) today introduced its latest addition to the 28xx brightfield inspection platform, featuring specialized optical configurations that solve the unique defect detection challenges of sub-55nm memory and sub-45nm logic chip manufacturers.
半导体检测设备行业专题报告:从KLA成长路径看国产替代进程
目前市场主要供应商为 KLA (Omni Map 系列)。 而透明薄膜则通常基于椭圆偏振技术,对光谱范围内的偏振变化进行分析,各种薄膜层提供 高精度薄膜测量,由于膜应力、折射率等物理性质同样需要椭圆偏振及干涉技术进行测量, 因此目前主流的膜厚测量设备同时集成了应力测量、折射率测量等功能,目前该类设备市场 主要供应商为 KLA(Aleris 系列、 SpectraFilm 系列)、 上海精测 (EFILM 系列) 关键尺寸扫描电子显微镜(CD-SEM):关键尺寸即栅极线条宽度,通常是指 …
KLA BBP 40th Anniversary
For 40 years our broadband plasma (BBP) patterned wafer inspectors have been at the forefront of defect discovery for the semiconductor industry. Introduced in 1984, the KLA 2020 was the first automated patterned wafer inspection system for chip production, replacing manual inspection by human operators.
Optical inspection machine - 29xx - KLA Corporation - for …
Using enhanced broadband plasma illumination technologies, such as Super•Pixel™ mode and advanced detection algorithms, the 2965 and 2950 EP inspectors provide the sensitivity required to capture critical defects across a range of process layers, material types and process stacks.
KLA-Tencor四款新系统提供先进的缺陷检测与检查能力
2014年7月9日 · KLA-Tencor推出四款新的系统——2920系列、Puma 9850、Surfscan SP5和eDR-7110——为16nm及以下的集成电路研发与生产提供更先进的缺陷检测与检查能力。
半导体设备研究系列之明暗场缺陷检测设备:一“明”一“暗”检缺 …
2022年12月9日 · 半导体量检测设备是第四大制程设备环节,诞生大公司KLA。量检测设备的市场 规模小于刻蚀、薄膜沉积设备、光刻机,但大于清洗设备、CMP、离子注入、 Track、电镀等环节。2021年,按销售额计,前道量检测设备全球市场规模104
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