Transene Chromium Etchants 1020 and 1020AC are high purity ceric ammonium nitrate systems for precise, clean etching of chromium and chromium oxide films. Chromium Etchant 1020AC …

Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our …

Cr-etch-210 is an alkaline etchant for Cr. The etchant is used for the wet-chemical patterning or removal of thin Cr layers with selectivity to metals like Au, Sn, Pt, Cu, Ni, Ti, Ta.

铬蚀刻剂是铬基溶液，可从底物移除多余金属。 这些蚀刻剂主要用于金属表面处理和电子工业。 蚀刻速率为4 mm/s，可用于蚀刻镍、铜和铬基多余金属。 [1] [2] [3] [4] 用于室温或高温条件。 …

Cr etch 210 is an alkaline etchant for Cr. The etchant is used for the wet-chemical patterning or removal of thin Cr layers with selectivity to metals like Au, Sn, Pt, Cu, Ni, Ti, Ta.

2001年5月1日 · We investigated the etch characteristics of chromium films by using gas mixtures with electron cyclotron resonance plasma. In order to examine the chemical etch …

TechniEtch Cr n:1 is based upon a mixture of perchloric acid (HClO4), and ceric ammonium nitrate (NH4)2[Ce(NO3)6]. Ceric ammonium nitrate itself is a very strong oxidizer. The …

Transene Chromium Etchants 1020 and 1020AC are high purity ceric ammonium nitrate systems for precise, clean etching of chromium and chromium oxide films. Chromium Etchant 1020AC …

2021年4月7日 · Cr and CrO x etching is typically performed using chlorine–oxygen-based plasma chemistries, but the nanoscale imposes limitations. In this work, directional etching is …

铬蚀刻剂是铬基溶液，可从底物移除多余金属。 这些蚀刻剂主要用于金属表面处理和电子工业。 蚀刻速率为4 mm/s，可用于蚀刻镍、铜和铬基多余金属。 [1] [2] [3] [4] 用于室温或高温条件。 …