Nanoimprint Lithography - Canon Global
Canon has achieved miniaturization at lower power consumption and lower cost with nanoimprint lithography (NIL), a new technology that is an alternative to conventional lithography …
Canon launches ASML challenge with machine to make most …
2023年10月13日 · Canon, the Japanese firm best known for its printers and cameras, launched a critical tool on Friday it says can help manufacture the most advanced semiconductors around. …
白話科技｜Canon奈米壓印設備出貨！奈米壓印技術是什麼？有望挑戰ASML EUV…
2025年1月2日 · 日本大廠佳能（Canon）於9月26日宣佈，首度出貨奈米壓印微影設備（Nanoimprint Lithography, NIL）給美國「德州電子研究所」。 該設備據稱可生產5奈米製程晶 …
Canon : Canon Technology | Canon Science Lab - Canon Global
In addition to fluoride dimer excimer lasers with wavelengths of 157 nm and X-ray lasers, EUV (Extreme Ultra-Violet) light sources are attracting keen attention. EUV sources have …
Canon Delivers Nanoimprint Lithography to Compete With EUV
2025年1月2日 · Canon's new nanoimprint lithography technology promises to revolutionize chipmaking by producing 14-nm circuit features at a fraction of the cost of EUV systems.
1. Canon’s Roadmap of EUVL tool 2. Exposure results of SFET 3. SFET illuminator enhanced plan 4. Preparation for the Full Field Tool 5. Requested NA and Resolution of EUVL 6. …
纳米压印光刻技术旨在与极紫外光刻（EUV）竞争-电子工程专辑
2025年1月8日 · 纳米压印光刻系统具有的优势可能对当今主导先进芯片制造、价值1.5亿美元的极紫外（EUV，https://spectrum.ieee.org/tag/euv）光刻扫描仪构成挑战。 如果佳能的说法正 …
Canon Prepares Nanoimprint Lithography Tool To Challenge EUV …
2023年10月17日 · The device uses nanoimprint lithography (NIL) technology as an alternative to photolithography, and can theoretically challenge extreme ultraviolet (EUV) and deep …
Canon aims to ship low-cost ‘stamp’ machine this year to disrupt …
2024年1月28日 · The process, says Canon, will be “one digit” cheaper and use up to 90 per cent less power than Netherlands-based ASML’s market-dominating and light-based extreme …
「先端半導体にはEUV露光装置」に待った、キヤノンのナノイン …
2023年12月19日 · 数nm世代の最先端半導体には、オランダasmlの極端紫外線（euv）露光装置が必須――。そんな状況にキヤノンが風穴を開けた可能性がある。長年、研究開発を続けて …