
Fabrication of 2-D Capacitive Micromachined Ultrasonic Transducer (CMUT ...
2022年1月8日 · In this paper, a 2D CMUT array based on silicon material was successfully fabricated following a silicon wafer bonding process. The CMUT working frequency is 3.8 MHz and the 6 dB bandwidth is 110%, which make it suitable for underwater ultrasonic imaging.
Practical CMUT Fabrication With a Nitride-to-Oxide-Based Wafer …
2017年5月5日 · The introduction of wafer-bonding technique to capacitive micromachined ultrasonic transducer (CMUT) fabrication offered advantages over the surface micromachining technique, such as simplified fabrication, better membrane uniformity, and increased active area.
Wafer-Bonding Fabricated CMUT Device with Parylene Coating
2021年5月4日 · The CMUT device is fabricated using silicon fusion wafer-bonding technology. A 5-?m thick Parylene-C is conformally deposited on the device for immersion measurement. The results show that the fabricated CMUT can transmit an ultrasound wave, receive an ultrasound wave, and have pulse-echo measurement capability.
Wafer Level Fabrication of cMUT using Bonding and …
The paper presents a wafer-level fabrication of a capacitive micromachined ultrasonic transducer (cMUT) using a wafer bonding process and interconnection techni
Fabrication and Characterization of CMUTs realized by Wafer …
Abstract: This paper presents the fabrication process and electrical characterization of Capacitive Micromachined Ultrasonic Transducers (CMUTs) realized by fusion bonding. The transducer array with electrical connections was realized by four photolithography steps. The electrical characterization of two different geometries is presented.
2016年9月1日 · This study shows that through-wafer trench-isolation with a supporting frame is a viable solution for providing electrical interconnects to CMUT elements and that 2-D arrays fabricated using wafer-bonding deliver good performance.
(PDF) Low temperature process for CMUT fabrication with wafer bonding ...
2010年11月14日 · We present the successful fabrication of capacitive micromachined ultrasonic transducers (CMUTs) based on low temperature wafer bonding (<;400°C). Such a fabrication process enables the direct...
A surface roughness of 0.47 nm is measured for the PSOI device layer, and successful fusion bonds (direct bonds) are demonstrated between PSOI wafers and oxidized silicon wafers. A wafer-bonded CMUT using a PSOI wafer is fabricated and electrically characterized, and the expected CMUT performance is observed.
CMUT device fabrication using wafer bonding technique for (a) …
Fig. 2 shows the process used for fabricating the CMUT arrays based on a wafer bonding technique. First, the highly conductive Si wafers (0.01-0.025 ohm-cm) are selected. Then 400-and...
Methods of fabrication and modeling of CMUTs – A review
2024年12月1日 · Fabrication of 2D capacitive micromachined ultrasonic transducer (CMUT) arrays on insulating substrates with through-wafer interconnects using sacrificial release process
- 某些结果已被删除