2025年1月26日 · 深紫外曝光技术（Deep Ultraviolet Lithography, DUV）是通过使用波长在2000~3000埃的光源来提高光刻图形的分辨率。 相比于传统的 4 000埃左右的 紫外光 ， 深 …

下面我们分别选择一款DUV和EUV光学系统，进一步探秘他们的光学设计。 DUV光刻系统实例： 厂家：Carl Zeiss. 波长：DUV -193.304nm. 类型：18P浸液微缩投影镜头. 文献-光学系 …

DUV technology for photolithography is exclusively based on projection optics since the pattern on the photomask is much larger than the final pattern developed on the photoresist. The optical …

We have been providing custom optics for semiconductor lithography and inspection equipment in the DUV range worldwide. Any shape can be produced by our masterful grinding and polishing …

DUV lithography optics (deep ultraviolet light) from ZEISS Semiconductor Manufacturing Technology (SMT) use light in the invisible ultraviolet spectrum with wavelengths of 365, 248 …

Jenoptik developed the technology specially for DUV optics with a high numerical aperture. The new concept enables optical elements to be set quickly, robustly and precisely to an accuracy …

2025年1月23日 · For more than 50 years, DUV technology has made it possible to combine the increasing demand for high-performance microchips with cost-efficient production – laying the …

The UV objective lenses and optics modules can be used for the latest developments in laser sources. They cover the entire DUV wavelength range, with the focus on 193 nm and 266 nm. …

Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic …

DUV Photolithography There are significant differences between typical UV photolithography and DUV photolithography. Due to the shorter wavelengths used there is much higher absorption …