We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub …

JBX-8100FS is a Direct Writing EBL System with Gaussian Beam Optics designed to implement High Throughput and High Precision requirements from a wide range of applications. The …

Electron beam lithography systems are necessary to precisely process such extremely fine circuits. As the demand for semiconductors further expands with the realization of the IoT …

JBX-6300FS can easily write patterns down to 8nm or less (actual result: 5nm) by the employment of an electron optical system that automatically adjusts a 2.1nm-diameter electron …

Today, JEOL is the world’s top supplier of EBL systems. Our customer's applications of the systems range from mask/reticle production for high-end devices and nano-lithography …

Representing 50 years of expertise in electron beam lithography, the all-new JEOL JBX-8100FS series spot beam lithography system is designed for higher throughput and lower operating costs.

The JBX-9500FS is an electron beam lithography system featuring a spot beam, Vector scan, and a step and repeat stage.

The JBX-9500FS is a spot beam lithography system developed to meet a wide range of applications with high throughput and high precision performance. This system covers fields …

In short, the new JBX-8100FS is quite simply the most innovative lithography system we have ever built. Reducing the instrument's footprint to 4.9 m (W) x 3.7 m (D) x 2.6 m (H) helps to …

品牌型号： JEOL，6300FS 主要功能： 电子束光刻技术是利用纳米电子束斑在光刻胶上扫描， 改变光刻胶的显影特性，可获得纳米级分辨率的图形结构。 技术指标： 套刻精度： 在高精度模 …