HOYA is the only blanks supplier that covers optical (ArF, KrF), EUV and FPD. We have continuing business especially for optical blanks for several decades. We will accelerate EUV blanks development using the infrastructure for 6 inch plates. Strong collaboration with stakeholders. Matured production engineering. Commitment to HVM.

AGC blanks have been widely used to fabricate EUV reticles for PPT exposure tools in EUVL pilot lines. AGC has provided 1st generation EUVL blanks suitable for

EUVL mask blanks are a low-thermal expansion glass substrate with various optical coating films on its surface. An EUV photomask comprises a semiconductor chip circuitry pattern formed onto the surface of an EUVL mask blank, which is then transferred onto a silicon wafer to create a semiconductor chip.

2018年11月15日 · Amid the ramp of extreme ultraviolet (EUV) lithography in the market, suppliers of EUV mask blanks are expanding their production. And a new player—Applied Materials—is looking to enter the market. AGC and Hoya, the two main suppliers of EUV mask blanks, are adding capacity for these critical components that are used for EUV photomasks.

2018年6月13日 · Applied’s Portfolio for EUV Masks Applied’s broad and deep photomask infrastructure and R&D capability offers unique ability to enable custom materials engineering and modifications to address customer’s problem

2024年8月26日 · Key aspects include imaging performance, defects, durability and mask manufacturability, and involve refined absorbers and capping layers. In this paper, we overview our effort to design and accomplish the EUV blanks design that meets criteria from industry. We will also describe the challenges for next generation EUV blanks.

EUV mask with new capping layer showed no change in reflectivity after CrN etching process. EUV masks were produced for evaluation of pattern images and mask inspection.

EUV mask blanks structure and defect breakdown. The blank consists of Si/Mo multilayer which is deposited on a polished substrate by an ion beam sputtering. Si, Si/Mo, AlOx and AlOx + Stainless Steel are dominant defects related to deposition process. Si family defects Resist Anti-reflective layer The others Si. 2-3. Failure analysis procedure.

•Most of the challenges in EUV mask blanks are in defects. •But defects are not unique to EUV. Defect reduction and stable supply are essential to lithography blanks in general. •HOYA is the only blanks supplier that covers optical (ArF, KrF), EUV, and LCD. Mo/Si ML Cap layer EUV blank LTEM Substrate Quartz ArF blank l=13.5nm l=193nm ...

2006年3月22日 · SCHOTT Lithotec has introduced all relevant technology steps to manufacture EUV mask blanks, ranging from Low Thermal Expansion Material (LTEM) with high quality substrate polishing to low defect blank manufacturing.