Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

3 天之前 · The two sides reached a clear consensus: The key to breaking the ice of domestic chips is the EUV lithography machine. In order to realize the rise of "China Core", the Chinese Academy of Sciences took the initiative to take over the task and established a special EUV core technology research team, which is bound to complete the breakthrough in ...

Chips made with EUV lithography are enabling smart technology (cars, phones and homes), augmented reality, artificial intelligence and much more. EUV lithography makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of …

2025年3月8日 · However, commercializing an alternative EUV lithography tool will challenge ASML's position. ASML's latest High-NA EUV tool costs around 380 million US Dollars. No matter the cost for Chinese R&D centers, the Huawei EUV machine will deliver the much-needed upgrade path for the older DUV scanners, which previously limited domestic chip production.

2023年7月13日 · These new machines will build chips that are designed for edge computing, in which more powerful and energy-efficient chips are installed in devices such as automobiles, wind farms, or health care equipment.

2023年6月26日 · To continue making chips smaller and smaller, we need powerful, accurate machines to manufacture those chips. This where EUV lithography, with research pioneered by IBM, comes in.

2024年11月28日 · The combination of EUV resistless lithography on a chip scale with atomic-scale hydrogen desorption patterning using scanning tunnelling microscopy could lead to large-scale fabrication of spin...

2024年7月31日 · The EUV Revolution: Breaking Barriers in Chip Design. EUV lithography represents a quantum leap in semiconductor manufacturing. By harnessing light with a wavelength of just 13.5 nanometers – about 14 times shorter than DUV – EUV can create chip features smaller than 7 nanometers.

5 天之前 · “Experience has shown that the smaller the chip structures are to be, the larger the optical system consisting of projection optics and illumination system will be." The illumination system for High-NA EUV lithography has about 25,000 parts and weighs six tons.

2025年1月21日 · China is constantly looking for innovative approaches toward advanced chipset development and one such is – EUV. Despite tougher restrictions and US chip controls, China is working on EUV (Extreme UltraViolet) lithography chipmaking tech. U.S. sanctions have prevented China from making advanced semiconductors.