Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

2023年6月26日 · In the case of EUV (or extreme ultraviolet) lithography, the light used is well beyond the visible light spectrum, with wavelengths only about 13 nanometers wide. This light doesn’t occur naturally on earth, but can be produced by using a high-powered laser that impinges upon droplets of tin to create plasma emitting light at this 13 nm ...

2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma. This, in turn, helps emit a short wavelength light inside a vacuum chamber.

Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.

2024年11月28日 · EUVL has emerged as a critical technique, taking advantage of shorter wavelengths to achieve nanoscale feature sizes with higher precision and lower defect rates than previous lithography methods.

2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.

EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.

EUV, DUV, XUV 以及 UV, VUV 都是电磁波波段分类的简称。 XUV：0.1～10nm. （3）注意：波长不是分辨率！ 他们之间的关系是 分辨率=k*波长/NA. NA是数值孔径；k 是常数，由成像系统决定，一般为0.5 或 0.61. EUV, DUV, XUV 以及 UV, VUV 都是电磁波波段分类的简称。 （1）它们的全称分别是UV = ultraviolet EUV = extremely ultraviolet VUV = vacuum ultraviolet DUV = deep ultraviolet XUV = X-ran ultraviolet（2）它…

EUV lithography – how does it work? The ASLM system exposes more than 170 wafers an hour with an extreme ultraviolet (EUV) beam. Here, exposing means structuring photoactive paint on wafers with an optical mask in around a hundred exposure passes with such precision that structures seven nanometers (nm) wide can be created.

The abbreviation EUV commonly stands for Extreme Ultraviolet, which refers to a region of the ultraviolet spectrum with wavelengths shorter than those of visible light, often utilized in various fields such as astronomy and photolithography. EUV is significant in advanced semiconductor manufacturing processes due to its ability to create ...