Entegris extreme ultraviolet light (EUV) reticle pod is designed defect-free protection of reticles and had demonstrates superior defectivity performance. Patented dual pod design secures reticle for transport and provides reticle protection in a vacuum environment

2022年9月12日 · 家登因為台灣先進製程大廠及美系IDM大廠的EUV Pods主力供應商；同時美中貿易下，中國加速擴建廠房，家登12吋FOUP在中國市場業務大幅成長，獲前段 ...

以子母盒雙層設計，提供6吋EUV光罩在製程站間傳送與儲存的高效能防護，內層EIP可於真空環境下操作。 支援充氣功能可對光罩傳送盒內部做微環境的溫溼度控制。

We offer an array of reticle SMIF pods, reticle EUV pods, and purge cabinets designed to protect, store, and transport valuable lithography reticles. These cost-effective designs provide an extremely high degree of contamination protection.

2023年12月12日 · EUV pods are used to transport, store and protect EUV masks in the photo lithography processes of advanced semiconductor fabs. The EUV pod has two main functions, 1) protecting EUV masks from contamination and physical damage, 2) providing interface with automation to ensure reliable sensing and pick-and-place.

The EUV pod from Entegris is a dual pod design having both an inner carrier and outer shell to maintain a contamination-free environment. In laboratory tests, the EUV pod was shown to provide defect-free protection of EUV reticles during shipping, storage, handling and vacuum-transferring operations with 40 nm SiO2 equivalent particle sizes.

根据新思界产业研究中心发布的《2023-2028年极紫外光光罩盒（EUV Pod）行业市场深度调研及投资前景预测分析报告》显示，当前在全球半导体产业向中国转移趋势不断加深以及国内AI、5G、物联网等新兴…

Extreme ultraviolet light (EUV) reticle pod is designed to provide defect-free protection of EUV reticles during storage, handling and vacuum-transfer operations.

2019年8月7日 · 由於半導體廠接單中只要多1層EUV光罩層需求，就要對應增加約240～260顆EUV Pod採購量，家登 （3680） 成為最大受惠者，現有產能滿載供不應求，訂單也已經排滿到明年上半年。

EUV Resist Outgassing Tool Measures the contamination of optics from resist outgassing by using EUV (Extreme Ultraviolet) photon exposure, or alternatively by using electron beam (e-gun) exposure