Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV lithography does big things on a tiny scale. The technology, which is unique to ASML, prints microchips using light with a wavelength of just 13.5 nm – almost x-ray range. EUV is driving Moore’s Law forward and supporting novel transistor designs and chip architectures.

極紫外光微影（英語：extreme ultraviolet lithography，中國大陸稱為極紫外光刻，簡稱「EUV」或「EUVL」）又稱作超紫外線平版印刷術, 是一種使用極紫外光波長的微影技術，目前用於7納米以下的先進製程，於2020年得到廣泛應用 [1] [2] [3] [4] 。

2024年11月28日 · EUVL has emerged as a critical technique, taking advantage of shorter wavelengths to achieve nanoscale feature sizes with higher precision and lower defect rates than previous lithography methods.

2024年11月7日 · Size: EUV machines are large, weighing 331,000 pounds and measuring 33 ft long, 17 ft wide, and 13 ft tall. They are shipped in 250 crates and require multiple transport aircrafts for delivery. Purpose: EUV machines are used in the high-volume manufacturing of advanced logic and memory chips.

2017年6月15日 · Source: Zeiss, “EUV lithography optics for sub-9nm resolution,” Proc. SPIE 9422, (2015). High-NA optics design available Larger elements with tighter specifications

(EUV) light (13.5 nm wavelength) for lithography. EUV light allows smaller features to be built on a semiconductor, increasing device area density. Developing commercial high-throughput EUV instruments has created the ability to mass-produce advanced microchips incorporating novel transistor designs and chip architectures.

2024年10月9日 · The industry standard EUV field and mask sizes are 26 by 33 millimeters and 6 by 6 inches, respectively. To make high-NA work, ASML and Zeiss opted to double the magnification in one direction, resulting in a half-sized field of 26 by 16.5 millimeters.

2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma. This, in turn, helps emit a short wavelength light inside a vacuum chamber.

2024年1月25日 · EUV lithography allowed us to make a big turn of the wavelength knob: It uses 13.5 nm light, compared to 193 nm for the highest-resolution DUV systems. When our first pre-production EUV lithography platform, the NXE, first shipped in 2010, it delivered a drop in CD from more than 30 nm in DUV down to 13 nm with EUV.