Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of …

Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use …

Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on …

步进投影式光刻机（stepper） 它使用透镜系统将掩模上的图案在小面积上逐个投影到硅片上。 每次曝光一个小区域后，硅片会移动到下一个位置，直到整个硅片都被曝光。

2020年6月5日 · 目前光刻设备按照曝光方式分为 Stepper和 Scanner两种。 Stepper是传统地一次性将整个区域进行曝光；而 Scanner是镜头沿 Y方向的一个细长空间曝光，硅片和掩模同时沿 …

Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. The TWINSCAN NXE:3600D combines imaging and overlay …

developed for 2D EUV Masks • Rigorous Mask modeling based on Frequency Domain • Uses Intel’s IPHOTO lithography simulator • Includes aberration modeling capability (phasemaps, …

2019年8月29日 · In five by five halls, the EUV steppers machines are completed. The current top model, the NXE:3400B, weighs 180 tons and needs 20 trucks or three fully loaded Boeing …

With each NXE:3400B model EUV stepper from ASML valued at US$125 million it costs $1 billion to invest in a set of 8 tools to begin high-volume manufacturing, and the entire lithography …