Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV lithography makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the most intricate layers on a chip, with the rest of the layers printed using various DUV systems.

At this moment, extreme ultraviolet (EUV) systems equipped with a 0.33 numerical aperture (NA) have proven themselves and are successfully applied in high-volume manufacturing. The next step is 0.55 NA and is ready to enter mass production.

2024年11月28日 · EUVL has emerged as a critical technique, taking advantage of shorter wavelengths to achieve nanoscale feature sizes with higher precision and lower defect rates than previous lithography methods.

2024年1月25日 · The headline advance in High NA EUV lithography is the new optics. The ‘NA’ in the name refers to numerical aperture – a measure of the ability of an optical system to collect and focus light. And it’s called High NA EUV because we’ve increased the NA from 0.33 in our NXE systems to 0.55 in EXE systems.

2025年3月8日 · However, this Huawei system must still answer questions about resolution capabilities, throughput stability, and integration with existing semiconductor manufacturing flows. However, commercializing an alternative EUV lithography tool will challenge ASML's position. ASML's latest High-NA EUV tool costs around 380 million US Dollars.

2023年6月26日 · In the case of EUV (or extreme ultraviolet) lithography, the light used is well beyond the visible light spectrum, with wavelengths only about 13 nanometers wide. This light doesn’t occur naturally on earth, but can be produced by using a high-powered laser that impinges upon droplets of tin to create plasma emitting light at this 13 nm ...

2022年3月30日 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV system, as well as a glimpse of what’s next.

2020年9月25日 · • EUV is generated within the plasma where temperature is sufficient to produce Sn ions of interest and the density is as high as possible. High power laser interacts with liquid tin producing a plasma. Plasma is heated to high temperatures creating EUV radiation. Radiation is collected and used to pattern wafers.

2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma. This, in turn, helps emit a short wavelength light inside a vacuum chamber.