ZEISS Semiconductor Manufacturing Technology enables microchip manufacturers worldwide to produce even smaller structures and thus more efficient microchips. Extreme ultraviolet …

EUV lithography uses extreme ultraviolet light with a wavelength of 13.5 nanometers to image the fine structures on the wafer. Mirrors from ZEISS SMT collect this light and ensure the projection of the photomask onto the wafer.

2024年1月30日 · With the so-called High-NA-EUV lithography, significantly smaller structures can be realized on the carriers of the microchips – the wafers – and thus even more powerful, energy-efficient and cost-effective chips can be produced. The first series production using the new technology is set to begin in 2025.

EUV program at ZEISS: Continuously improving resolution. The ZEISS Starlith®3400 optics delivers excellent imaging... ...for the ASML NXE:3400B scanner. Displaying the information of one NXE:3400B field, requires a TV screen of 780m x 1370m. The Starlith® 3400 projection optics performs with improved aberrations – consistent for shipped systems.

We are shipping 0.33NA optics in high volume to the customers. We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing. EUV roadmap extensions are visible.

This system will enable highest resolution for patterning process simplification combined with highest productivity potential – and it looks feasible: The optical system for the ultimate lowest cost/pixel printing machine! Many thanks to: - The big teams of ZEISS, ASML and our partners

2000年7月13日 · Extreme Ultraviolet Lithography (EUVL), using 13 nm radiation, has a high probability to become the Next Generation Lithography of choice for resolutions of 50 nm and below. The work at CARL ZEISS focusses on the development of optical system design and core technologies necessary for the industrialization of EUVL optical systems.

Outline EUV Program at Zeiss Source Collector Module and Illuminator Optics Fabrication and Metrology Coatings

EUV lithography is entering the market for high volume manufacturing of electronic devices. First EUV based electronic components have been manufactured on customer site by use of the NXE:3400 scanner with ZEISS Starlith®3400 optics. For …

Mammoth efforts are al-lowing the semiconductor industry and its suppliers to introduce a new technolo-gy today, EUV lithography (EUVL), which will continue to drive progress over the next decade through miniaturization. This article deals with the perspectives of EUVL and the challenges of the technology, and reviews its development.