2015年7月1日 · In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high …

Nanoimprint lithography (NIL) is a method of fabricating nanometer -scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns …

2011年1月1日 · Two of the most critical steps of NIL are mold release and pattern transfer through dry etching. These require that the NIL resist have low surface energy and excellent …

2020年4月1日 · A new type of a specifically tailored resist for Soft Nanoimprint Lithography (Soft UV-NIL) namely mr-NIL213FC has been developed. It aims for a significant improvement of its …

2020年3月1日 · The so-called mix-and-match approach helps to overcome the throughput limits of FE-SPL. Micrometer and nanometer layouts can be generated on the same resist combining …

Altogether, an improved wet chemical residual layer etch leads to a comparable optical and a superior electrical performance for the presented photonic rear concept based on NIL. [1] R. …

2017年5月3日 · By employing a platinum (Pt) metalized imprint mode, we demonstrated that using electrochemical nanoimprint lithography (ECNL) it was possible to fabricate not only …

2010年2月1日 · NIL is based on the principle of mechanically modifying a thin polymer film (mechanical deformation of the resist) using a template (mold, stamp) containing the …

NIL, a versatile, cost effective, and flexible high-throughput method for fabrication of structures as small as 10 nm, has a wide range of application within, for example, data storage, optics, and …

Comparison of the dry etching rate between sapphire and mr-NIL210. Brilliant film forming characteristics, film stability, film thickness uniformity, and storage stability over several hours. …