Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV lithography makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the most intricate layers on a chip, with the rest of the layers printed using various DUV systems.

2025年3月8日 · China's domestic extreme ultraviolet (EUV) lithography development is far from a distant dream. The newest system, now undergoing testing at Huawei's Dongguan facility, leverages laser-induced discharge plasma (LDP) technology, representing a potentially disruptive approach to EUV light generation.

A global leader in the production of at-wavelength extreme ultraviolet (EUV) metrology tools, EUV Tech supplies the semiconductor manufacturing industry with leading-edge metrology solutions using extreme ultraviolet light and soft-x-ray technology.

2024年5月17日 · TSMC says that it has managed to increase wafer-per-day-per-tool productivity of its EUV systems by two times since 2019. To do so, the company optimized the EUV exposure dose and the...

Nikon is developing a full field exposure tool (EUV1) for 45nm hp process development and 32nm hp R&D. EUV2 (HVM) can be developed adopting the best available EUV light source and infrastructure.

ZYGO corporation got contracted to build several EUV-L Micro-Field Exposure Tools with 0.5NA, known as MET5. Those tools are used for infrastructure development required for the EUV …

The EUV Resist Outgassing tool is designed to quickly expose a wafer with Extreme Ultraviolet (EUV) light, or an electron beam, to determine resist characteristics.

Over the years, the resolution of these tools has improved from several micrometers in the early 1970s to 13 nm in state-of-the-art extreme ultraviolet (EUV) tools [λ = 13.5 nm, numerical aperture (NA) = 0.33] and will improve even further down to 8 nm in what are called high-NA EUV exposure tools (NA = 0.55).

5 天之前 · High NA EUV tools will likely play a critical role in chip development in the future, particularly as processing nodes continue to become more advanced for next-generation microprocessors, memory and other electronic components.