2023年4月19日 · We show that the EUV-FEL light source has many advantages, such as extremely high EUV power without tin debris, upgradability to a Beyond EUV (BEUV) FEL, polarization controllability for high-NA lithography, low electricity consumption, and low construction and running costs per scanner, as compared to …

2024年6月23日 · 基于ERL的EUV-FEL可以通过使用能量回收方案和超导加速器技术，克服当前EUV光刻的问题，成为最强大的EUV光源。 本文设计并研究了一种基于ERL的EUV-FEL光源，用于未来光刻，并在前面的文章中阐明了EUV-FEL光源的设计理念和未来前景。

能量回收型自由电子激光(ERL FEL)光源可实现高重复频率、高平均功率、高能量利用效率的激光输出。 随着FEL 和ERL 技术的发展,ERL FEL 光源在13.5 nm 波长处可实现超过10 kW的功率输出[16-17],是一种极具潜力的大功率EUV光刻光源。

An energy recovery linac(ERL)-based free electron laser(FEL) is a possible candidate of a tens of kW EUV source for lithography. The ERL can provide a high-current and high-quality electron beam for the high-power FEL and also greatly reduce the dumped beam power and activation compared to ordinary linacs because it recover most acceleration ...

Ryukou Kato桑的报告里提出使用能量回收型直线加速器做为EUV光源，使用800MeV电子能量，10mA的平均流强就能够得到9kW+的EUV，同时可以调节波荡器（Undulator）得到不同波长（3.4nm，13.5nm等），这种装置提供的EUV功率强悍，可以共多台光刻机同时使用（本文最开头 …

FEL is an amplifier and decelerator (laser absorbs energy from e-beam, albeit at a moderate rate < 1 MeV/m) IFEL is an accelerator: e-beam absorbs energy from the high power laser

In this paper, we show that the EUV-FEL light source has many advantages such as extremely high EUV power without tin contamination of EUV mirrors, upgradability to a Beyond EUV (BEUV) FEL, polarization controllability, low elec-tric power consumption and cost per scanner, as compared to the laser-produced plasma (LPP) source used in the pre ...

We are proposing ERL-based FEL as a future light source in the EUV region for future lithography such as 3nm and 2nm node. KEK installed two undulators in the cERL southern straight section and develop a mid-infrared (MIR) FEL with high average power for NEDO project.

One of the promising approaches to the problem is to use a free-electron laser (FEL) as a high-power radiation source [2{4]. This approach relies on a well established technology of a super-conducting accelerator to generate a relativistic, high-current, high-repetition-rate electron beam which can produce a kW level of EUV radiation when sent ...

Is there still a case for EUV FELs? What needs to be done from here? E.R. Hosler, O.R. Wood, W.A. Barletta, P.J.S. Mangat and M.E Preil, Considerations for a free-electron laser-based extreme-ultraviolet lithography program. Proceedings of SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI. 94220D. 2015.