5 things you should know about High NA EUV lithography - ASML
2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.
High-NA EUV光刻机入场，究竟有多强？ - 36氪
High-NA EUV被认为是可以降低工艺复杂性和制造成本，并是制造2nm及以下的尖端制程的关键设备。 High-NA 不仅需要新的光学器件，还需要新的光源材料，例如德国蔡司在真空中制造的一个由抛光、超光滑曲面镜组成的光学系统，甚至还需要新的更大的厂房来容纳这种机器，这都将需要大 …
High NA EUV at Intel
2024年4月18日 · Intel Foundry has received and assembled the industry’s first High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography system. The new tool provides the ability to dramatically improve resolution and feature scaling for the next generation of processors, enabling Intel Foundry to continue process leadership beyond Intel 18A.
ASML揭秘High NA EUV光刻系统背后的内容、原因和方法-EDN 电 …
2024年1月29日 · 经过十年的研发，ASML 于 2023 年 12 月正式向英特尔交付了首个High NA（高数值孔径）EUV 光刻系统——TWINSCAN EXE:5000的首批模块， 代表着尖端芯片制造向前迈出了重要一步。 目前芯片制造商依然是依靠晶体管微缩来推动微芯片技术的进步。 虽然，这并不是改进芯片的唯一方法，例如，新颖的架构、先进封装等也可以提高性能。 但摩尔定律本质上成为普遍法则是有原因的 ：50 多年来，晶体管“微缩”一直是计算能力指数级增长的幕后推手。 多年 …
EUV lithography systems – Products - ASML
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm. The EXE platform will support high-volume chip manufacturing in 2025–2026, enabling geometric chip scaling into the next decade.
With High NA EUV, Intel Foundry Opens New Frontier in …
2024年4月18日 · The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors.
High-NA-EUV Lithography - the next EUV generation | ZEISS SMT
With High-NA-EUV lithography, an optical resolution of less than ten nanometers is possible on the microchip – compared to the current EUV generation, this means around three times more structures on the same area.
High-NA-EUV: New technology for global microchip production
2024年1月30日 · With the so-called High-NA-EUV lithography, significantly smaller structures can be realized on the carriers of the microchips – the wafers – and thus even more powerful, energy-efficient and cost-effective chips can be produced. The first series production using the new technology is set to begin in 2025.
Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing.
Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. Mirror roughness after polishing <61pm rms for all measurement points. Measured on Micro Interferometer (Field of View ~5mm)
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