Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically …

沉浸式光刻技术是在传统的光刻技术中，其镜头与光刻胶之间的介质是空气，而所谓浸入式技术是将空气介质换成液体。实际上，浸入式技术利用光通过液体介质后光源波长缩短来提高分辨 …

2023年8月2日 · In December of the same year, we publicly announced the industry’s first immersion lithography system, the TWINSCAN XT:1250i. This pre-production system …

浸没式光刻技术是在传统的光刻技术中，其镜头与光刻胶之间的介质是空气，而所谓浸入式技术是将空气介质换成液体。

193nm immersion lithography (193i) has been accepted by IC manufacturers as a manufacturing patterning solution at least down to the 45nm half-pitch node. Immersion lithography is a …

2008年12月4日 · The current work in immersion lithography started in 2001 with the report of Switkes and Rothschild. Although their first proposal was at 157 nm wavelength, their report in …

Immersion lithography utilizes liquids with refractive indices >1 (the index of air) to enable sub-45-nm feature size (or half-pitch) patterning for semiconductor integrated circuits.

Advanced processes for 193-nm immersion lithography / Yayi Wei and Robert L. Brainard. p. cm. Includes bibliographical references and index. ISBN 978-0-8194-7557-2 (alk. paper) 1. …

2006年2月23日 · Immersion Lithography: Introduction: Semiconductor microlithography is the primary process for printing circuit patterns for microelectronic devices. In this process a …

2022年10月26日 · Immersion lithography improves lithography resolution by increasing the NA, or "numerical aperture". It goes from a previous maximum of 0.93 to 1.35 or higher - collecting …