With sensitivity to detect classical defects (intrusions, extrusions, and point defects), the TeraScan 597XRS can inspect numerous reticle types including chrome-on-glass, sub-resolution optical proximity correction (OPC), embedded phase shift, and alternating phase shift, at both 248 nm and 193 nm wavelengths.

KLA/TENCOR TeraScan SL597XR是一种用于半导体制造和计量行业的掩模和晶圆检测设备。 它结合了KLA TeraScan SL系列产品的前沿光学检查和成像能力以及功能强大的TENCOR Unified Platform软件套件。

2022年4月12日 · KLA’s team of engineers developed state-of-the-art technologies that provide the Teron SL670e and Teron SL670e XP systems with the performance required to accurately assess EUV reticle quality. The Teron systems achieve high sensitivity to critical defects through advances in thermal stability, focus tracking and imaging flexibility, and the ...

2024年9月25日 · 半导体检测领域的领头羊kla科磊（简称kla）的产品线广泛且深入，覆盖了半导体制造和相关电子行业的多个关键环节。 KLA的产品线主要包括用于检验、测量、数据分析的系统以及软件等，这些产品广泛应用于IC、晶圆和掩模的研发和制造过程中。

凭借独特的技术和强大的连接性，我们的392x和295x检测器和eDR7380检测系统构成合作组合，为先进逻辑IC、DRAM、3D NAND从研发到批量生产的过程提供全方位的解决方案，针对 …

KLA / TENCOR TeraScan SL597XR is a mask and wafer inspection equipment used in the semiconductor manufacturing and metrology industry. It combines the leading-edge optical inspection and imaging capabilities of KLA TeraScan SL family of products with the powerful TENCOR Unified Platform software suite.

kla/tencor 597xr是一种高精度的掩模和晶圆检测工具，结合光学技术、自动化工艺和测量能力，对半导体制造工艺提供高度精确的成像和分析。 KLA / TENCOR 597XR 晶圆检测仪 用于销售价格 #9277549, 2006 > 从 CAE 购买

kla/tencor 597xr是一種高精度的掩模和晶圓檢測工具，結合光學技術、自動化工藝和測量能力，對半導體制造工藝提供高度精確的成像和分析。 KLA / TENCOR 597XR 光罩與晶圓檢測設備 用於銷售價格 #9277549, 2006 > 從 CAE 購買

2007年3月15日 · Designed to handle the demands of the 45nm node, with its small linewidths and complex OPC, the TeraScanHR system features higher imaging resolution and precise database modeling for high defect detection sensitivity and low false detections in both die-to-die and die-to-database modes.

KLA Tencor's TeraScan is a defect detection scanner that evaluates masks, or 'reticles' used in the microelectronics and semiconductor fabrication (wafer fab) process, insuring that they are error-free. The TeraScan in this cutaway illustration uses a detection method known as 'deep ultraviolet' (DUV) reticle inspection to evaluate various ...