With sensitivity to detect classical defects (intrusions, extrusions, and point defects), the TeraScan 597XRS can inspect numerous reticle types including chrome-on-glass, sub-resolution optical proximity correction (OPC), embedded phase shift, and alternating phase shift, at both 248 nm and 193 nm wavelengths.

The Zeta ™-5xx Series optical profilers are fully automated 300mm wafer metrology systems capable of measuring a variety of applications such as bump height, RDL (redistribution layer) CD, UBM (under bump metallization) step height, film thickness and wafer bow, which are critical to process control in advanced wafer-level packaging. Multi ...

As the latest offering in the successful 5XX product line, the new X5.2 applies its high performance to capture defects and pattern degradation on masks currently in production, with extended capability for the upcoming 20nm node.

作为成功的 5xx 产品线的最新产品，新的 x5.2 系统具备极高性能，不仅能够捕捉目前生产 中光罩上的缺陷与图案退化，并且具备扩展至将来20 纳米节点的能力。

Zeta-5xx系列光學輪廓儀是全自動300mm晶圓量測系統，能夠測量包括凸塊高度、RDL（再分佈層）CD、UBM（凸塊下金屬化）臺階高度、薄膜厚度和晶圓彎曲等各種 應用，這些對先進晶圓級封裝中的製程控制都至關重要。

2006年10月17日，KLA创始人Ken Levy (“KL”)因期权丑闻被迫离开了这家自己掌舵超过三十年的公司，而另一位创始人Bob Anderson (“A”)比他早走了十多年。 Levy的父母都是初中没毕业的残障人士，靠经营打印店为生。 他说自己下学后都没时间玩，因为要帮助照顾家里的小生意。 但这些经历，如同mini MBA那样教会他如何做小生意，而KLA的业务正是以“小生意”组成的。 Levy的父母并没有钱送他去上大学，所以他上的是当时极少有的免费大学：纽约城市学院。 毕业后，Levy …

KLA Tencor 5XX TeraStar cutaway. Reticle defect inspection scanning system used in semiconductor chip production.

KLA Tencor's TeraScan is a defect detection scanner that evaluates masks, or 'reticles' used in the microelectronics and semiconductor fabrication (wafer fab) process, insuring that they are error-free. The TeraScan in this cutaway illustration uses a detection method known as 'deep ultraviolet' (DUV) reticle inspection to evaluate various ...

We have more 5xxx & Archer parts not listed as well...

2022年12月6日 · KLA’s comprehensive portfolio of inspection, metrology & data analytic systems helps manufacturers manage yield through the entire IC fabrication process.