High-brightness (radiance) lightsources are needed for high speed optical inspection of wafers. A broad range of wavelengths is required for flexibility in optical mode selection. DC-driven electrical arc sources have been traditionally employed for microscope illumination.

For the last 8 years, the brightness of UV lightsources in KT Broadband inspection tools increased by orders of magnitude due to advances in LSP technology. Challenges of LSP in high-power regime are discussed here.

2015年5月12日 · Although diode lasers are highly efficient, compact, and low-cost light sources for LSP, previous studies have reported that the laser power required for LSP generation is high, owing to the...

PDF | On Oct 27, 2017, I Bezel and others published High Power Laser-Sustained Plasma Light Sources for KLA-Tencor Broadband Wafer Inspection Tools | Find, read and cite all the research you...

At K-T, we are pushing LSP performance to orders of magnitude higher brightness than any alternative broad-band source. Optimal LSP operating conditions depend on the spectral region for collection, etendue requirements, and available pump power. Accurate modeling and understanding plasma behavior are required to succeed.

2024年9月28日 · Surfscan产品系列是KLA科磊针对晶圆表面缺陷检测而开发的一系列高精度、高效率的检测设备。 这些 产品 采用先进的光学技术、图像处理算法和数据分析技术，能够实现对 晶圆 表面微小缺陷的精准识别和 检测 。

2015年5月10日 · For the last 8 years, the brightness of UV lightsources in KT Broadband inspection tools increased by orders of magnitude due to advances in LSP technology. Challenges of LSP in high-power regime are discussed here. Argon–xenon laser-sustained plasma (LSP) was generated using a 1-kW class diode laser.

2024年8月12日 · 本文即介绍了KLA在光学检测中的主要研究，特别是激光维持等离子体技术（laser-sustained plasma, LSP），LSP作为一种光照强度高、光谱范围宽、发光稳定的新型辐射光源, 在光学检测 (半导体晶圆检测) 等领域具有重要的应用价值。

2022年9月1日 · Researchers from KLA-Tencor used a 20 kW near-infrared laser with a central wavelength of 1.07 μm to maintain the Xe plasma forming “Sirius” light box for wafer defect detection. The system uses an elliptical reflector with a solid angle of more than half a sphere to focus the laser beam to make the plasma smaller and brighter [ 8 ].

High-brightness (radiance) lightsources are needed for high speed optical inspection of wafers. A broad range of wavelengths is required for flexibility in optical mode selection. DC-driven...