2022年4月12日 · KLA’s team of engineers developed state-of-the-art technologies that provide the Teron SL670e and Teron SL670e XP systems with the performance required to accurately assess EUV reticle quality. The Teron systems achieve high sensitivity to critical defects through advances in thermal stability, focus tracking and imaging flexibility, and the ...

2023年5月10日 · 根据VLSI Research 统计，2020年全球前五大半导体量测公司KLA、应用材料、日立、雷泰光学和创新科技市场份额合计超过82.4%，市场集中度较高， KLA一家独大，全球市场份额为50.8%。

KLA’s metrology systems address a range of chip and substrate manufacturing applications, including verification of design manufacturability, new process characterization and high volume manufacturing process monitoring.

2022年12月6日 · A stage with industry-leading dynamic range helps to obtain diffraction images at multiple angles to render rich 3D geometrical information. Novel AcuShape® algorithms facilitate measurement of many critical device parameters and extraction of subtle variations that can affect final memory chip functionality.

1998-1999年，KLA连续收购了干涉测量(德国Nanopro)、扫描电子显微镜(美国 Amray)、产线图像管理(美国 VARS)和硅片缺陷分析(美国 Uniphase)等技术。 到了新世纪，KLA收购的脚步并没有减慢。据统计，迄今KLA-Tencor共收购了27家公司。

Our metrology solutions provide precise measurement of pattern dimensions, film thicknesses, layer-to-layer alignment, pattern placement, surface topography, wafer geometry and in situ processes.

KLA Instruments提供光学轮廓仪、探针式轮廓仪、纳米压痕仪、薄膜厚度仪、方块电阻测试仪以及晶圆缺陷检测和量测系统。

DirectIndustry（工业在线展会）为您提供表面缺陷检测系统产品详细信息。规格型号：Teron™ 6xx series，公司品牌：KLA Corporation。直接联系品牌厂商，查询价格和经销网络。寻找更多国外精选表面缺陷检测系统产品和供应商采购信息，尽在DirectIndustry。

The eDR7280 is a new generation wafer defect review and classification system from KLA-Tencor that meets high resolution defect review requirements of advanced semiconductor production and

Leveraging KLA-Tencor’s patented AIM™ technology and Archer Analyzer™ software, the Archer 100 enables in-chip metrology and in-field analysis for advance dispositioning and higher-order overlay control.