The MEB550S is a field-proven e-beam evaporator that incorporates all the know-how accumulated by PLASSYS after having built several tens of such systems. Its thoroughly optimized design stems from both the numerous years of experience and the generous feedback of our returning customers.

MEB550SL3法国Plassys超高真空多腔体电子束镀膜机，电子束蒸镀仪是纳米器件制备中必不可少的仪器，用于蒸镀各种高纯金属薄膜，如Ti, Au, Ni, Cr, Al, Al2O3等。 电子束蒸发沉积法可在同一蒸发沉积装置中安装多个坩埚，使得可以蒸发和沉积多种不同的高质量金属薄膜。 开展量子计算机实验研究，如基于金刚石NV色心，离子阱，超导量子结，量子点电子自旋的研究，均需要蒸镀各种高质量金属薄膜来制备量子器件，特别是在利用超导量子结来实现量子计算的实验研究中. 电 …

The model MEB 550-S provides thin film coating and Argon ION etching. Our system is equipped with 6 kW, 8-15cc pocket e-Gun, thickness monitoring, sample heater, and direct temperature monitoring. A variety of evaporation source materials are available. The system has an ultimate vacuum on the order of 1.1 x 10-8 mbar.

The MEB550S 4×4” machine allows sequential processing of up to 4 wafers. The higher-capacity electron gun has 12 × 15cc crucibles, enabling the deposition of a wide variety of materials (Au, Pt, Cr, etc.). The manipulator is tiltable to adjust the orientation for deposition at normal or to a limited controlled angle for step-by-step coverage.

The MEB 550 S2 is a UHV type evaporator with three chambers. This computer controlled evaporation tool dedicated for fabrication of quantum devices. It has a high precision tilting/rotating sample holder for shadow evaporation, and …

The Plassys MEB550SL3 UHV Evaporator is an equipment specially designed for Josephson junctions fabrication and Qubit applications. The system allows monolayer or multilayer deposition of metals under controlled angle (shadow deposition) and oxides growth. The system is composed of 3 x chambers with each their capabilities: Loadlock.

In 2010, the very first UHV evaporation system dedicated to the manufacture of superconducting circuits and qubits was delivered to Yale University.

型号：MEB 550SL3 . 产地：欧洲 法国 . 应用：约瑟夫森结（Al, Nb, NbN, NbTiN） 超高真空多腔体电子束蒸发镀膜仪. 电子束蒸镀仪是纳米器件制备中必不可少的仪器，用于蒸镀各种高纯金属薄膜，如Ti, Au, Ni, Cr, Al, Al2O3等。

Evap Plassys MEB 550 S Electron beam evaporator for metallic thin films / PLASSYS. Contacts : BAPTISTE Téo / AASSIME Abdelhanin Location : E42 The Plassys MEB550S evaporator is an equipment allowing the deposition of thin metallic layers on various substrates from cm2 to 4".

法国PLASSYS-BESTEK SAS公司生产的超导约瑟夫森结制备设备（型号为MEB550 SL3）包括三个互联的超高真空腔体，其中进样腔与真空互联主管道连接且具有Ar离子刻蚀（IBE）功能；与之连接的蒸镀腔则利用电子束加热金属源而进行物理气相沉积（PVD）；与蒸镀腔相连的是氧化腔，其主要的功能是能进行金属表面的可控高精度高均匀性氧化。 进样腔、蒸镀腔和氧化腔的极限真空度分别可达2.0 x10-8 Torr， 2.2 x10-10 Torr和 2.0 x10-9 Torr。 进样腔和蒸镀腔样品台均 …