在这里解释一下“na”即光学系统的数值孔径，表示光线的入射角度，使用更大的na透镜可以打印出更小的结构，目前的euv光刻机使用的还是na=0.33的 ...

2024年11月5日 · The machine, known as high numerical aperture extreme ultraviolet (High NA EUV) lithography equipment, costs over USD 350 million each and allows semiconductor manufacturers to produce wafers with smaller transistor line widths, according to Nikkei.

2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.

2024年6月3日 · Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML Holding N.V. (ASML), a leading lithography supplier to the semiconductor industry, today announced the opening of the High NA EUV Lithography Lab in Veldhoven, the Netherlands, a lab jointly run by ASML and imec.

2024年11月3日 · The high numerical aperture extreme ultraviolet (High NA EUV) machine, which is said to cost more than $350 million apiece, will allow chip makers to print features smaller than before.

2024年11月25日 · According to media reports, market sources previously indicated that TSMC received its first High-NA (High Numerical Aperture) extreme ultraviolet (EUV) lithography machine, the EXE:5000, from Dutch semiconductor equipment manufacturer ASML in …

2022年4月20日 · High-NA extreme ultraviolet (EUV) lithography is currently in development. Fabrication of exposure tools and optics with a numerical aperture (NA) equal to 0.55 has started at ASML and Carl Zeiss.

A lot of people connected to the industry have been questioning high NA EUV's profitability. Pat's answer in an interview about it was interesting. We've looked at it pretty carefully - when you go to double patterning versus single patterning with High-NA.

2024年5月9日 · Intel received its first High NA EUV machine from ASML in January 2024, with assembly of the Oregon-housed machine completed in mid-April. The TWINSCAN EXE:5000 is the first commercial lithography system of its kind and Intel has previously said it plans to use the equipment to reduce its total number of outsourced wafers.

2024年4月17日 · ASML , the biggest supplier of equipment to computer chip makers, said on Wednesday said it has shipped one of its newest "High NA" EUV lithography systems to a second customer.